High voltage solutions for E-beam lithography

Low temperature coefficient with no partial discharges

E-beam lithography allows the creation of nanoscale patterns in semiconductor manufacturing and research applications. However, partial discharge and low stability at high voltages impact the performance of e-beam lithography tools which can lead to lost revenue for semiconductor manufacturers.

High stability power supplies prevent yield issues

The stability, precision and performance needed in a power supply

Equipment damage due to short circuit and shielding issues is a problem for design engineers as it affects yield. To deliver the performance needed, e-beam tools require power solutions with high precision and a low temperature coefficient with no partial discharges.

Our integrated and customized solutions provide the high voltage stability, low ripple and short circuit protection you need.