High voltage solutions for e-beam lithography
Low temperature coefficient with no partial discharges
E-beam lithography allows the creation of nanoscale patterns in semiconductor manufacturing and research applications. However, partial discharge and low stability at high voltages impact the performance of e-beam lithography tools which can lead to lost revenue for semiconductor manufacturers.
High stability power supplies prevent yield issues
The stability, precision and performance needed in a power supply
Equipment damage due to short circuit and shielding issues is a problem for design engineers as it affects yield. To deliver the performance needed, e-beam tools require high voltage e-beam power supplies with high precision and a low temperature coefficient with no partial discharges.
Our integrated and customized high voltage e-beam sputtering power supplies provide the high voltage stability, low ripple and short circuit protection you need.
Low ripple for precise beam control
Clean, tightly regulated output ensures consistent beam positioning for advanced lithography and research designs.
Partial discharges and voltage instability can compromise nanoscale patterning, causing yield loss and equipment issues.
XP Power’s high voltage e-beam power supplies deliver ultra-stable, low-ripple output with a low temperature coefficient, ensuring precise and reliable operation for critical semiconductor manufacturing and research applications.
Short circuits and shielding issues can damage sensitive e-beam equipment and reduce production yield.
XP Power’s e-beam sputtering power supplies provide integrated short circuit protection, high precision, and robust stability. This assures you safe, consistent performance in your e-beam lithography and sputtering applications.